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Contamination Control Engineer

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IPG Photonics Corporation

Oxford, MA (In Person)

Full-Time

Posted 1 week ago (Updated 5 days ago) • Actively hiring

Expires 6/30/2026

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Job Description

IPG Photonics is revolutionizing the laser industry as the pioneering developer and leading producer of fiber lasers and amplifiers. Headquartered in Marlborough, MA, IPG has over 4,800 employees in more than 30 locations around the world. We aspire to work together with our employees and customers to apply light in ways that improve life. Our mission is to develop innovative laser solutions to make the world a better place. To accomplish this mission, we are committed to attracting and retaining the best talent and an engaged and thriving workforce that drives a sustainable future for our company and society. Working at IPG Photonics you can expect challenging projects, a motivating and friendly environment, and working hand-in-hand with skilled teams of software and hardware engineers. Job Summary We are seeking a highly experienced engineer with a strong foundation in chemistry to lead contamination control and manufacturing process development for deep-ultraviolet (DUV) laser systems. This role requires deep expertise in photochemistry, surface chemistry, and contamination mechanisms that impact the performance, reliability, and lifetime of DUV optical systems. The ideal candidate will have hands-on experience diagnosing and mitigating chemically driven degradation in high-energy UV environments.
This is a technically demanding role with significant influence on materials selection, manufacturing process development, and long-term system reliability. Key Responsibilities Lead and advance contamination control strategies for DUV laser manufacturing
Analyze and mitigate photochemical and surface-driven degradation mechanisms affecting optics, coatings, crystals, and surrounding materials
Evaluate and select materials, including polymers, metals, adhesives, coatings, solvents, and cleaning agents for compatibility with deep-UV exposure
Develop and qualify cleaning, passivation, and handling processes based on chemical and surface-science principles
Lead root-cause analysis of DUV-induced failures and contamination-related issues
Model and experimentally validate contamination transport, adsorption/desorption, and photo-induced reactions in DUV environments
Collaborate closely with R D teams to translate laboratory-scale DUV solutions into robust manufacturing processes
Define contamination-control specifications, cleanliness requirements, and acceptance criteria
Support supplier qualification, engagement, and audits related to chemical cleanliness and material compatibility
Mentor junior engineers and serve as a subject-matter expert in DUV contamination control and chemistry Advanced degree in Chemistry, Chemical Engineering, Materials Science, or a related field
Deep understanding of photochemistry, surface chemistry, and molecular contamination under deep-UV irradiation
Proven experience identifying and resolving contamination-driven performance or lifetime limitations in optical or laser systems
Strong knowledge of organic and inorganic contamination sources, outgassing, adsorption/desorption, and UV-induced chemical reactions
Experience working in contamination-sensitive environments such as cleanrooms or precision optics manufacturing
Familiarity with cleaning processes, contamination-control methods, and handling procedures for optical and laser components
Hands-on experience with DUV systems operating at 266 nm or shorter wavelengths in manufacturing, process engineering, or applied research environments
Strong analytical and problem-solving skills, with the ability to connect chemical mechanisms to system-level behavior
Experience with Failure Mode and Effects Analysis (FMEA)
Experience with surface-analysis and contamination-diagnostics tools
Proficiency in Statistical Process Control (SPC) methodologies and statistical analysis software
Background in reliability engineering for DUV optical systems preferred
Experience defining cleanliness standards for high-energy UV or photolithography-related applications preferred